 | | Inspection & Review Systems |
Hitachi High-Technologies offers a variety of defect inspection systems for both patterned and un-patterned wafers to address the needs to reduce defectivity and to enhance the manufacturing yield. These optical inspection systems provide high sensitivity for small killer defects and other critical defects of interest at high throughputs in both volume production as well as research and development environments.
Hitachi's defect review SEM systems utilize advanced optical and electron microscopes to support a broad spectrum of review applications. Our electron microscope applies Hitachi's proprietary immersion lens design to provide high resolution and high contrast imaging capability for multiple perspective detectors, thus ensuring high capture rates for automated defect redetection (ADR) at high throughput. The UV-laser optical microscope provides the leading edge detection sensitivity, and is ideally suited for critical defect review for unpatterned wafers. The on-board automated defect classification (ADC) capability is accurate and flexible with user-definable and user-teachable classification.
Product List: