Product Number:S-4300 SE/N
The S-4300SE/N combines the benefits of a Schottky Field Emission gun, Variable Pressure technology and Hitachi’s ESED imaging capability. When operating in Variable Pressure mode, the S-4300SE/N provides high-resolution images of all types of insulating materials or biological samples. The S-4300SE/N’s optional chamber design provides a superior analytical configuration to optimize the performance of CL, EDX, WDS, and EBSD applications. High current and stability make the S-4300SE/N ideal for Electron Beam Lithography and other dynamic experiments.