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Deep Trench
New technologies and complex designs often necessitate the development and improvement of novel processes. Many integration and process engineers view deep trench etch as their next etch process milestone. Hitachi recognized this and developed cutting edge processes in this area. Hitachi's latest work involves etching of specialty isolation schemes and charge storage cells for next generation SOC designs.
Si Etching (difference within a wafer) |
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Edge |  |
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SOI Etching (difference within a wafer) |
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Edge |  |
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